ƒeƒLƒXƒg ƒ{ƒbƒNƒX: 6th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology Technical Program

 

 

 

 

 

Sep. 26, 2005, 13:30 ~ 19:00  /   Sep.27, 2005, 9:00 ~ 17:30

KKR Hotel Tokyo

http://www.kkr-hotel-tokyo.gr.jp   TEL : 03-3287-2921/  FAX : 03-3287-2913

Workshop web siteF http://sakura.nucleng.kyoto-u.ac.jp/ws2005/index-en.html

Monday Afternoon, September 26th

13:30-

Opening Address

 

Greetings by Guests

 

 

 

 

Greeting by

Workshop organizer

I. Yamada, Workshop Chairman

 

H. Tsuchiya, Ministry of Economy, Trade and Industry (METI)

 

T. Yamamoto, New Energy and Industrial Technology Development Organization (NEDO)

 

K. Tsuji, Osaka Science & Technology Center (OSTEC)

 

Session 1a                               Session Chair K. Fujii (Osaka Sci. & Tec. Center)

13:45-14:45

 

(Invited)

Novel Properties of Nano-Size Clusters

K. Kaya  (Discovery Research Institute, RIKEN)

14:45-15:45

(Plenary)

Review of Gas Cluster Ion Beam Technology in 2005

I. Yamada  (Project Leader, Kyoto University Professor Emeritus)

15:45-16:00

Coffee Break

 

 

Session 1b                                   Session Chair J. Matsuo (Kyoto University)

16:00-16:45

(Invited)

GCIB Applications and Production Equipment

A. Kirkpatrick  (Epion corporation)

16:45-17:30

(Invited)

Electronics and Photonics Integration on Si CMOS Platform

K. Wada  (The University of Tokyo)

17:30-19:00

Social Party

11F Kujyaku Room, KKR Hotel Tokyo

 

 

 

Tuesday Morning, Sep 27st

Session 2a                                      Session Chair T.Seki (Kyoto University)

9:00-9:30

(Invited)

Insight Provided by Computer Simulation of Energetic Cluster Impacts on Solid Surfaces

Roger P. Webb (University of Surrey, UK)

9:30-9:50

Molecular Dynamics Study of Surface Structure and Sputtering Process by Sequencial Fluorine Cluster Impacts

T. Aoki   (Quantum Science and Engineering Center, Kyoto University)

9:50-10:10

X-ray Reflectivity Measurement of Diamond-Like Carbon Films

J. Matsui (Hyogo Prefectural Center for Advanced Science and Technology, University of Hyogo)

10:10-10:30

Gas Cluster Ion Beam System for FBAR and USJ Applications

K. Kasuga (Hakuto Co, Ltd.)

10:30-10:50

Development of a Compact Gas Cluster Ion Source

S. Shimizu (Research & Development Division, ULVAC, Inc.)

10:50-12:00

Poster Session

10F Heian Room, KKR Hotel Tokyo

12:00-13:00

Lunch

 

 Tuesday Afternoon, Sep 27st

Session 2b                                  Session Chair J. Matsui (University of Hyogo)

13:00-13:30

 

(Invited)

Study of Charge, Mass and Energy of Large Gas Cluster Ions with Applications for Surface Processing

David Swenson (Epion corporation)

13:30-13:50

Experimental Study of Cluster Size Effect with Size-selected Cluster Ion Beam

N. Toyoda (Laboratory of Advanced Science and Technology for Industry, University of Hyogo)

13:50-14:10

Surface Processing with High-Energy Gas Cluster Ion Beams

T. Seki  (Quantum Science and Engineering Center, Kyoto University)

14:10-14:30

Decaborane Implantation with The Medium Current Implanter

K. Matsuda  (Nissin Ion Equipment Co., Ltd.)

14:30-14:50

Ultra-shallow Junction Formation by Cluster Ion Implantation for 45nm Node and Beyond

T. Kuroi    (Renesas Technology Corp.)

14:50-15:05

Coffee break

Session 2c                                 Session Chair N. Toyoda (University of Hyogo)

15:05-15:20

Fluoride Optical Coating Formation by GCIB Assisted Deposition

T. NiisakaiNikon Corporationj

15:20-15:35

Development of The Mold Surface Correction and Smoothing Using GCIB

T. Imamura and M. Suzuki (Olympus Corporation)

15:35-15:50

Characteristics of Super-hard Coating Formed with Gas Cluster Ion Beam Assisted Deposition

T. Kitagawa (Nomura Plating Co., Ltd.)

15:50-16:05

Recent Progress in hAdvanced Nano-Fabrication Process Technology using

Quantum Beamh Project

J. Matsuo (Quantum Science and Engineering Center, Kyoto University)

16:05-16:20

 

 

 

16:20-16:35

 

 

 

16:35-16:50

 

 

16:50-17:05

 

 

17:05-17:20

 

 

Ultra-smoothing using Gas Cluster Irradiation at Glancing Angles - Photonic Crystal Applications and Smoothing Mechanisms

E. Bourelle (Japan Aviation Electronics Industry, Ltd.)

 

Damage and Recovery of Single Crystalline Silicon after Gas Cluster Ion Beam Irradiation.

H. Tokioka (Mitsubishi Electric Corporation)

 

Development of A New Cluster Size Selector

@   K. Owaki (Kawasaki Heavy Industries, Ltd.)

 

Surface Smoothing of Compound Semiconductor SiC Using Gas Cluster Ion Beam

T. Ichihashi (Mitsui Engineering & Shipbuilding Co., Ltd.)

 

Study of Damage-free and Ultra-smooth Process of Magnetic Materials using Off-normal Gas Cluster Ion Beam Irradiation

S. Kakuta (Hitachi, Ltd.)

 

17:20-17:30

Question & Answer

17:30

Closing Remarks

 

 

 

Poster presentations, Tuesday Morning, Sep 27st

Heian Room, KKR Hotel Tokyo, 10:50 ~ 12:00

 

*Decaborane implantation with the medium current implanter

1K. Matsuda, 1N.Hamamoto, 1S.Umisedo, 1T.Nagayama, 1M.Tanjyo, 1S.Sakai, 1N.Nagai 2T.Aoyama

1Nissin Ion Equipment Co., Ltd.

2Fujitsu Laboratories Ltd.

 

Low-Damage Sputtering of GaAs and GaP Using Ar Cluster Ion Beams

1M.Nagano, 1S.Yamada, 2N.Toyoda and 2I.Yamada

1Materials Science Research Laboratory, Central Research Institute of Electric Power Industry (CRIEPI)

2Laboratory of Advanced Science & Technology for Industry, University of Hyogo

 

* Ultra-smoothing using gas cluster irradiation at glancing angles - Photonic crystal applications and smoothing mechanisms

E. Bourelle, A.Suzuki1 and A.Sato

Central Research Laboratory, Japan Aviation Electronics Industry, Ltd.

 

* Damage and Recovery of Single Crystalline Silicon after Gas Cluster Ion Beam Irradiation.

H.Tokioka, T.Fujino, H.Yamarin and M.Inoue

Advanced Technology R&D Center, Mitsubishi Electric Corporation

 

* Development of A New Cluster Size Selector

K.Owaki and S.Fujii

Kawasaki Heavy Industries, Ltd.

 

GCIB applications and Production Equipment

    D.Rosser and T.Shimada, Epion Japan Corp.

 

* Surface Smoothing of Compound Semiconductor SiC Using Gas Cluster Ion Beam

T.Ichihashi, N.Miyatake and M.Ebata

Mitsui Engineering & Shipbuilding Co., Ltd

 

* Study of Damage-free and Ultra-smooth Process of Magnetic Materials using Off-normal Gas Cluster Ion Beam Irradiation

1S.Kakuta, 1S.Sasaki, 1K.Furusawa, 2T.Seki, 2T.Aoki, and 2J.Matsuo

1Storage Technology Research Center, Hitachi, Ltd.

2Quantum Science Engineering Center, Kyoto University

 

* Surface Processing with High-Energy Gas Cluster Ion Beams

T.Seki and J.Matsuo

Quantum Science and Engineering Center, Kyoto University

 

* Molecular Dynamics Study of Surface Structure and Sputtering Process by Sequential Fluorine Cluster Impacts

T. Aoki and J.Matsuo

Quantum Science and Engineering Center, Kyoto University

 

* Characteristics of super-hard coating formed with gas cluster ion beam assisted deposition

T.Kitagawa and T.Ikeda

Nomura Plating Co., Ltd.

 

* Development of a Compact Gas Cluster Ion Source

S. Shimizu

Research & Development Division, ULVAC, Inc.

 

Development of GCIB irradiation system combined with STM

1S.Houzumi, 1Y.Nakayama, 1K.Takeshima, 2N.Toyoda, 1K.Mochiji and 2I.Yamada

1Graduate School of Engineering, University of Hyogo

2Laboratory of Advanced Science and Technology for Industry, University of Hyogo

 

Low temperature fluoride film formation with gas cluster ion beam

1T.Nose, 1S.Nakazawa, 2N.Toyoda, 1K.Mochiji, 1T.Mitamura and 2I.Yamada

1Graduate School of Engineering, University of Hyogo

2LASTI, University of Hyogo

 

Cluster size effects of sputtering yield with gas cluster ion beams

1Y.Nakayama, 1K.Nakamura, 2N.Toyoda and 2I.Yamada

1Graduate School of Engineering, University of Hyogo

2LASTI, University of Hyogo

 

Beam characteristics of gas cluster ion beam apparatus

1T.Mashita, 2K.Nakamura, 2N.Toyoda and 2I.Yamada

1Osaka Science and Technology Center

2Laboratory of Advanced Science and Technology for Industry, University of Hyogo

 

 

l       Oral Presentation Paper